單晶
摻雜
導(dǎo)電
類型
載流子濃度cm-3
位錯(cuò)密
度cm-2
生長(zhǎng)方法
最大尺寸
標(biāo)準(zhǔn)
基片
GaSb
None
None high R
Zn
Te
Te high R
P
P-
P+
N
N
1~2×1017
1~5×1016
1~5×1018
2~6×1017
1~5×1016
<103
LEC
Φ3″
Φ3″×0.5
Φ2″×0.5
Typical Electrical Properties
Dopant available
Te
Zn
Undoped
Type of conductivity
N
P
P
Concentration ( cm -3 )
1E17 - 5E18
2E17 - 4E18
x
Hall Mobility ( cm 2 / v.s. ) 
2500 - 3500
200 - 500
600 - 700
 
Standard Specifications
Growth method
LEC
Diameter ( mm )
50.8
Thickness ( um )
500 +/-25 um
Conductivity
Semi-conducting
Orientation
< 100> , < 111> , < 110>
Off orientation
From 2° to 10° off
Flat options
EJ or US SEMI. Std .
Surface finish
One side or two sides polished
EPD ( cm-2)
< 1000 or < 10000
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